产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Vanadium Tungsten Tantalum Titanium (VWTaTi) Sputtering Target
| 材料类型 | VWTaTi Target |
|---|---|
| 元素符号 | VWTaTi |
| 原子量 | 2N5,3N |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Vanadium Tungsten Tantalum Titanium (VWTaTi) Sputtering Target Description:
Low-activation, high-entropy alloys with vanadium, tungsten, tantalum, and titanium as the main elements possess
an excellent balance between strength and toughness.
Vanadium-tungsten-tantalum-titanium alloy sputtering targets are primarily used in:
Semiconductors and integrated circuits
Advanced coating and functional coatings
High-temperature strength, oxidation resistance, and heat corrosion resistance.
Related Sputtering Targets
NiV7 sputtering target
CoFeV sputtering target
FeV sputtering target
VCr sputtering target
VTiZr sputtering target
V2O5 sputtering target
VNiFeAl sputtering target
VWTaTi sputtering target
