Nickel (Ni) Sputtering Target Description:

Nickel sputtering targets are an important type of metal sputtering target. 

Shape Types

**Nickel Planar Targets:** The most common flat target material, suitable for most magnetron sputtering equipment. 

   Square targets: 50×50×3mm, 100×100×4mm, 300×300×5mm; Round targets: φ50×3mm, φ76.2×3mm, φ101.6×5mm

**Nickel Round Targets**: Cylindrical or disc-shaped targets. φ25.4×3mm, φ50.8×4mm, φ152.4×6mm, etc.

**Nickel Rotating Targets**: Tubular rotatable targets, high utilization rate, suitable for large-area coating. 

   Length can be customized, commonly used in the flat panel display industry.

Irregular Shaped Targets: Non-standard shapes customized according to customer equipment requirements. 

Stepped targets, multi-arc targets, etc.

Due to their high purity, excellent corrosion resistance, good electrical and thermal conductivity, 

and unique magnetism, they have become an indispensable core material in many high-tech fields.

1. Semiconductors and Integrated Circuits:

2. Magnetic Storage and Sensors: Magnetic thin films; electromagnetic shielding

3. Decorative and Functional Coatings: High-end decorative coatings; optical device coatings.

4. New Energy and Special Applications.

Nickel thin films themselves possess a bright, silvery-white metallic luster and excellent corrosion resistance, 

thus finding wide application in everyday consumer goods and high-precision optical devices.

Ni-4N5-COA

Related Sputtering Targets

NiFe sputtering target