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Titanium (Ti) Sputtering Target


材料类型 Ti Target
元素符号 Ti
原子量 2N7,4N,4N5,5N
原子序数 As request
颜色/外形 Planar,Disc,Rotary etc
热导率 1-3week W/m.K
熔点 Support Customize (°C)
沸点 Support (°C)
热膨胀系数 Semiconductors, display panels, optics, solar energy, and functional coatings /K
产品简介

Titanium (Ti) Sputtering Target Description:

Titanium (Ti) sputtering targets are fundamental materials for depositing high-purity titanium thin films across

 a broad spectrum of advanced industrial, electronic, and optical applications. Renowned for their excellent 

corrosion resistance, high thermal stability, strong film adhesion, and good electrical conductivity, pure titanium 

targets serve as a cornerstone material for high-quality functional and protective coatings.


Semiconductor & Microelectronics

Widely utilized as diffusion barrier layers, adhesive layers, and electrode materials in integrated circuits, semiconductor wafers, 

and electronic packaging, ensuring reliable device performance and interconnect stability.


Protective & Wear-Resistant Coatings

Applied to deposit hard, corrosion-resistant, and wear-resistant films on medical devices, automotive components, and precision 

mechanical parts, significantly extending service life under harsh conditions.


Optical & Decorative Coatings

Used in the fabrication of optical filters, reflective layers, and high-end decorative coatings, offering excellent optical properties and surface finish.


Aerospace & Industrial Applications

Employed for high-temperature oxidation-resistant coatings and structural functional films in aerospace components, turbine parts, and chemical processing equipment.


Thin-Film Solar & Energy Devices

Served as electrode and back-contact layers in thin-film photovoltaic and energy storage systems, supporting efficient charge transport and device durability.


Research & Materials Development

Essential for academic and industrial research in thin-film technology, surface engineering, and advanced material synthesis.

Pure Ti sputtering targets are fully compatible with DC and RF magnetron sputtering systems, delivering stable sputtering performance, 

uniform film thickness, and high-purity thin-film deposition.
Ti-4N-COA
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