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- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
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- Vanadium & Vanadium Alloy Target
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- Niobium & Niobium Alloy Target
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- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Niobium Nickel (NbNi) Sputtering Target
| 材料类型 | NbNi Target |
|---|---|
| 元素符号 | NbNi |
| 原子量 | 3N |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Niobium Nickel (NbNi) Sputtering Target Description:
Niobium Nickel (NbNi) sputtering targets are high-performance binary alloy materials widely used for depositing magnetic, corrosion-resistant, and high-temperature stable thin films in advanced electronic, magnetic, aerospace, and industrial applications. With excellent magnetic properties, good thermal stability, strong adhesion, low internal stress, and uniform film formation, NbNi binary alloys are ideal for high-durability functional coatings, magnetic thin films, and precision electronic components.
Common ratio:
Common Ratio (NbNi, wt% or at%) | Application Characteristics |
Nb:Ni = 10:90 | High nickel content, excellent magnetic properties and ductility, suitable for magnetic thin films, electronic sensors and decorative coatings. |
Nb:Ni = 20:80 | Balanced magnetic performance and corrosion resistance, widely applied in magnetic storage devices, electronic packaging and automotive component coatings. |
Nb:Ni = 30:70 | Good thermal stability and adhesion, suitable for high-temperature protective coatings, semiconductor auxiliary films and precision magnetic components. |
Nb:Ni = 50:50 | Excellent comprehensive performance, including corrosion resistance and magnetic saturation strength, applicable to aerospace components and harsh environment coatings. |
Nb:Ni = 70:30 | High niobium content, good high-temperature resistance and mechanical strength, suitable for high-temperature equipment coatings and superconducting auxiliary films. |
Nb:Ni = 90:10 | Mainly used for high-temperature protective and corrosion-resistant coatings, with excellent thermal stability and chemical inertness. |
Semiconductor & Microelectronics
Applied as magnetic thin films, diffusion barrier layers, and conductive metallization layers in integrated circuits, magnetic sensors, and electronic packaging, effectively improving device magnetic performance and service life.
Magnetic Thin Films & Sensors
Widely used to deposit high-performance magnetic thin films for magnetic storage media, magnetic sensors, and electromagnetic components, leveraging the excellent magnetic properties of NbNi alloys.
Aerospace & High-Temperature Equipment
Widely used to deposit high-temperature resistant, corrosion-resistant coatings on aerospace components, engine parts, and high-temperature industrial equipment, maintaining structural integrity under extreme environments.
Corrosion & Wear-Resistant Coatings
Suitable for fabricating high-hardness, corrosion-resistant coatings on industrial equipment, precision machinery, and molds, resisting erosion from harsh media and reducing wear.
Optical & Functional Thin Films
Used for preparing magnetic-optical thin films, reflective layers, and functional films with excellent mechanical and magnetic properties, applicable to optical instruments and optoelectronic devices.
Research & Advanced Coating Development
Widely used in materials science, thin-film deposition research, and the development of next-generation magnetic, electronic and industrial coating systems.
NbNi sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition, uniform film composition, and high-quality thin-film formation, which can fully meet the application needs of various fields.
Related Sputtering Targets
NbTi Sputtering Target
NbCr Sputtering Target
NbNi Sputtering Target
NiMo Sputtering Target
Nb Sputtering Target







