产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Titanium Aluminum (TiAl) Sputtering Target
| 材料类型 | TiAl Target |
|---|---|
| 元素符号 | TiAl |
| 原子量 | 2N8, 3N |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Titanium Aluminum (TiAl) Sputtering Target Description:
Titanium Aluminum (TiAl) sputtering targets are widely used for depositing high-performance protective, conductive,
and optical thin films in advanced industrial and electronic applications. With excellent oxidation resistance,
high-temperature stability, good adhesion, and uniform film formation, TiAl alloys are ideal for functional and protective coating solutions.
High-Temperature Protective Coatings
TiAl targets are commonly used to deposit oxidation-resistant and corrosion-resistant layers for aerospace, gas turbines, and high-temperature components.
Semiconductor & Microelectronics
Applied as barrier layers, adhesive layers, and metallization materials in integrated circuits, wafers, and electronic packaging.
Optical & Functional Films
Used for producing optical coatings, reflective films, and decorative hard coatings with high durability and stability.
Aerospace & Automotive
Suitable for high-performance surface enhancement of engine parts and structural components requiring light weight and heat resistance.
Research Applications
Widely used in materials science, thin film research, and advanced coating development.
TiAl sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring.
TiAl50at%-3N-COA
Related Sputtering Targets
TiAl Sputtering Target
TiAlSi Sputtering Target
TiNb Sputtering Target
TiNi Sputtering Target
