产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Cobalt Chromium Nickel (CoCrNi) Sputtering Target
| 材料类型 | CoCrNi Target |
|---|---|
| 元素符号 | CoCrNi |
| 原子量 | 3N, 3N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Cobalt Chromium Nickel (CoCrNi) Sputtering Target Description:
Co-Cr-Ni alloy sputtering targets are high-performance ternary alloy sputtering targets.
High-end applications (such as semiconductors and medical applications) typically require a purity of 99.9% (3N)
or higher to strictly control impurity content, especially the control of elements such as O, C, and N.
Common ratio:
CoCrNi 1:1:1 at%
CoCrNi50/30/20at%
Custom processing is available according to the specific requirements of the customer's coating equipment
(such as magnetron sputtering machines): planar targets, circular targets, and irregularly shaped targets.
Application areas: Biomedical; Aerospace; Information storage; Semiconductors and microelectronics:
Conductive and barrier layers: used for thin film deposition in semiconductor devices.
Electrode materials: used to prepare electrodes in display technologies (such as TFTs). New energy and marine engineering:
Corrosion resistance and conductivity.
CoCrNi-3N-COA
Related Sputtering Targets
CoCr sputtering target
CoCrNi sputtering target
CoFeB sputtering target
CoCu sputtering target
