产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Iron (Fe) Sputtering Target
| 材料类型 | Fe Target |
|---|---|
| 元素符号 | Fe |
| 原子量 | 3N,3N5,4N |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Iron (Fe) Sputtering Target Description:
Iron sputtering targets are widely used in thin film deposition processes across various industries.
With good magnetic properties, excellent adhesion, and cost efficiency, iron (Fe) targets are an ideal material for functional and decorative coatings.
Semiconductor Industry:
Used as adhesion layers and seed layers in integrated circuits and microelectronic devices.
Magnetic Storage:
Applied in the production of magnetic thin films for hard disk drives and data storage devices.
Optical Coatings:
Suitable for anti-reflective coatings and optical film applications.
Surface Engineering:
Used to produce wear-resistant and protective coatings on tools and mechanical components.
Research Applications:
Widely used in laboratories for thin film research and sputtering experiments.
Iron targets are compatible with DC magnetron sputtering and vacuum coating systems, making them suitable for both industrial production and R&D.
Fe-4N-COA
Related Sputtering Targets
FeNi Sputtering Target
FeNiCo Sputtering Target
FeCo Sputtering Target
NiCr Sputtering Target
