产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Vanadium (V) Sputtering Target
| 材料类型 | V Target |
|---|---|
| 元素符号 | V |
| 原子量 | 3N,3N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Vanadium (V) Sputtering Target Description:
Vanadium target material has a uniform internal structure, high density, and stable sputtering performance.
Thanks to the excellent properties of vanadium metal, such as high hardness, corrosion resistance,high temperature resistance, and good electrical conductivity, vanadium sputtering targets have wide applications in many
high-tech fields.
1. Semiconductors and electronic devices
2. Information displays and optoelectronic devices
3. New energy and aerospace
4. Cutting-edge technologies and functional coatings
Medical and industrial coatings: Depositing nickel-vanadium thin films on medical devices can provide wear resistance,
corrosion resistance, and antibacterial properties. It is also widely used for decorative coatings on watches, hardware, etc.
V-3N5-COA
Related Sputtering Targets
V2O5 sputtering target
VWTaTi sputtering target
