Indium (In) Sputtering Target Description:

Indium (In) sputtering targets are low-melting-point, highly ductile metal targets, characterized by their high purity, 

excellent conductivity, and good adhesion. While pure indium targets have wide applications, 

they are best known as the base material for preparing ITO (indium tin oxide) targets—

ITO is currently the core material for transparent electrodes in all flat panel displays and touchscreens.

Purity ranges from 4N to 6N; 99.99% to 99.9999%. 

Shapes include: planar indium targets, rotating indium targets, and irregularly shaped indium targets.

Planar targets: Traditional target shapes, including round and square targets, suitable for most standard sputtering equipment.

Rotating targets: Widely used in the display panel field in recent years, 

offering advantages such as high material utilization, fast deposition rate, and good film uniformity.

Irregularly shaped targets: Non-standard shapes customized according to specific equipment requirements.

Application areas: 

Indium targets and their derivative, ITO targets, are key materials connecting the optoelectronic information industry.

Display panel field: 

Core of transparent electrodes

Voltage solar cells

Semiconductors and Microelectronics

Optical Devices and Infrared Coating

Bonding and Welding Materials

In-5n-COA

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