Chromium Aluminum (CrAl) Sputtering Target Description:

Chromium-aluminum targets are an important extension of chromium targets. By adding aluminum to chromium, 

a CrAl alloy target is formed. The chromium-aluminum nitride (CrAlN) coating, formed by combining with nitrogen 

in reactive sputtering, exhibits superior high-temperature oxidation resistance and hot hardness 

compared to pure chromium or chromium nitride (CrN) coatings, making it an ideal choice for high-speed, 

high-temperature cutting conditions.

Common ratios: 

Chromium-aluminum 70/30 at%

Chromium-aluminum 50/50 at%

Chromium-aluminum 30/70 at%

Chromium planar targets: Mostly rectangular or circular plates, manufactured using powder metallurgy hot pressing technology, 

resulting in high density and fine grains.

Applications requiring extremely high film uniformity include semiconductors and high-end decorative coatings.

Chromium rotating targets: Tubular, mostly formed integrally using hot isostatic pressing (HIP) technology, 

offering high material utilization and enabling continuous and stable production.

Applications include large-area architectural glass coating, automotive parts, and large-scale tool coating production lines.

The core applications of chromium-aluminum targets are highly focused on "tool coating," aiming to provide 

high-performance hard coatings for various cutting tools and molds.

Cutting tools (core application): Used in drills, end mills, indexable inserts, etc. The deposited CrAlN coating maintains 

high hardness (i.e., hot hardness) even under the high temperatures generated by high-speed cutting and forms 

a dense alumina protective layer.

Molds and components: Used in stamping dies, injection molds, die-casting molds, automotive piston rings, etc.

High-end decorative and functional coatings: Used in watches, mobile phone casings, hardware parts, etc.

CrAl50at%-3N-COA

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