Titanium Aluminum (TiNi) Sputtering Target Description:

Titanium Nickel (TiNi) sputtering targets are widely used for depositing shape memory alloy thin films and

 functional metallic coatings in high‑technology electronic, medical, and micro‑engineering applications. 

With unique shape memory effect, superelasticity, excellent biocompatibility, strong adhesion, and high uniformity, TiNi alloys are ideal for high‑value smart thin‑film materials.

Shape Memory & Microactuator Devices

TiNi targets are widely used to fabricate thin‑film microactuators, microswitches, micropumps, and responsive MEMS structures.

Medical Device Coatings

Applied for biocompatible and corrosion‑resistant coatings on implantable medical devices, surgical tools, and cardiovascular components.

Semiconductor & MEMS Manufacturing

Used as functional thin films, adhesive layers, and structural materials in microelectromechanical systems and advanced semiconductor packaging.

Sensors & Microswitches

Suitable for thin‑film pressure sensors, temperature sensors, strain sensors, and mechanical microswitch applications.

Research & Advanced Materials

Widely applied in smart materials, thin‑film metallurgy, and next‑generation functional coating research.

TiNi sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition and high‑quality thin films.

Related Sputtering Targets
TiAl Sputtering Target
TiAlSi Sputtering Target
TiNb Sputtering Target
TiNi Sputtering Target