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Tantalum Niobium (TaNb) Sputtering Target

材料类型	TaNb Target
元素符号	TaNb
原子量	3N5
原子序数	As request
颜色/外形	Planar,Disc,Rotary etc
热导率	1-3week W/m.K
熔点	Support Customize (°C)
沸点	Support (°C)
热膨胀系数	Semiconductors, display panels, optics, solar energy, and functional coatings /K

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产品简介

Tantalum Niobium (TaNb) Sputtering Target Description:

Tantalum Niobium (TaNb) sputtering targets are high-performance binary alloy materials widely used for depositing high-temperature resistant, corrosion-resistant, and barrier thin films in advanced electronic, semiconductor, and industrial applications. With excellent thermal stability, chemical inertness, strong adhesion, low internal stress, and uniform film formation, TaNb binary alloys are ideal for high-durability functional coatings and barrier layers.

Common ratio:

TaNb 3/97, 10/90, 20/80, 30/70, 40/60, 50/50, 70/30, 97/3 (wt% or at%) —— among them, TaNb 40/60 (Ta-40%Nb, corresponding to UNS R05240 standard) is a widely used ratio, and TaNb 3/97, 20/80, 30/70 are also common specifications in industrial and sputtering applications.

Semiconductor & Microelectronics

Applied as diffusion barrier layers, passivation coatings, and high-temperature stable metallization layers in integrated circuits, wafers, and electronic packaging, effectively preventing element interdiffusion and improving device reliability.

High-Temperature Protective Coatings

Widely used to deposit oxidation and corrosion-resistant layers for aerospace components, engine parts, and surface protection under extreme high-temperature environments.

Corrosion-Resistant Films

Suitable for fabricating highly inert and corrosion-resistant coatings in chemical processing equipment, fuel cells, and harsh chemical environment applications.

Optical & Functional Films

Used for preparing optical coatings, reflective layers, and high-stability functional thin films with excellent mechanical and optical properties.

Research & Advanced Coating Development

Widely used in materials science, thin-film deposition, and high-performance coating research.

TaNb sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition and high-quality thin films.

Common Ratio (Ta-Nb Alloy, wt% or at%)	Application Characteristics
Ta:Nb = 10:90	Widely used in general industrial sputtering, with balanced mechanical properties and cost advantages.
Ta:Nb = 20:80	Suitable for electronic component coating, with good adhesion and high temperature resistance.
Ta:Nb = 50:50	Excellent corrosion resistance, applicable to harsh working environment coating preparation.
Ta:Nb = 80:20	High tantalum content, suitable for high-precision electronic component thin film deposition.