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Tantalum Titanium (TaTi) Sputtering Target

材料类型	TaTi Target
元素符号	TaTi
原子量	3N5
原子序数	As request
颜色/外形	Planar,Disc,Rotary etc
热导率	1-3week W/m.K
熔点	Support Customize (°C)
沸点	Support (°C)
热膨胀系数	Semiconductors, display panels, optics, solar energy, and functional coatings /K

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产品简介

Tantalum Titanium (TaTi) Sputtering Target Description:

Tantalum Titanium (TaTi) sputtering targets are high-performance binary alloy materials widely used for depositing high-performance barrier, protective, and high-temperature resistant thin films in advanced electronic, optical, and industrial applications. With excellent oxidation resistance, thermal stability, strong adhesion, low internal stress, and uniform film formation, TaTi binary alloys are ideal for high-durability functional coatings.

Common ratio:TaTi 10/90, 20/80, 30/70, 50/50, 70/30, 90/10 (wt% or at%)

High-Temperature Protective Coatings
TaTi targets are commonly used to deposit oxidation and corrosion-resistant layers for cutting tools, engine components, and surface protection under extreme environments.

Semiconductor & Microelectronics
Applied as diffusion barrier layers, encapsulation films, and passivation coatings in integrated circuits, wafers, and electronic packaging.

Optical & Protective FilmsUsed for fabricating durable optical coatings, anti-reflection films, and hard protective layers with high thermal and mechanical stability.

Thin-Film Encapsulation & Barrier Materials
Suitable for gas barrier films, moisture-resistant coatings, and insulating layers in display and optoelectronic devices.

Research & Advanced Coating Development
Widely used in materials science, thin-film deposition, and high-performance coating research.

TaTi sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition and high-quality thin films.

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