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Aluminum Chromium (AlCr) Sputtering Target

材料类型	AlCr Target
元素符号	AlCr
原子量	3N
原子序数	As request
颜色/外形	Planar,Disc,Rotary etc
热导率	1-3week W/m.K
熔点	Support Customize (°C)
沸点	Support (°C)
热膨胀系数	Semiconductors, display panels, optics, solar energy, and functional coatings /K

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产品简介

Aluminum Chromium (AlCr) Sputtering Target Description:

Aluminum Chromium (AlCr) sputtering targets are high-performance binary alloy materials widely used for depositing high-hardness, corrosion-resistant, and high-temperature stable thin films in advanced industrial, optical, and electronic applications. Combining the excellent oxidation resistance of aluminum with the outstanding hardness, wear resistance, and chemical stability of chromium, AlCr alloys exhibit superior performance in harsh environment protective coatings and functional thin films.

With excellent film adhesion, low internal stress, uniform deposition, and high thermal stability, AlCr sputtering targets are ideal for fabricating high-durability protective and functional coatings.

Common Ratio (AlCr, wt% or at%)	Application Characteristics
Al:Cr = 10:90	High chromium content, excellent corrosion and wear resistance, suitable for harsh industrial environment protective coatings and cutting tool coatings.
Al:Cr = 20:80	Balanced oxidation resistance and mechanical properties, widely applied in automotive parts, aerospace components and electronic device protective coatings.
Al:Cr = 30:70	Good adhesion and thermal stability, suitable for optical thin films, decorative coatings and semiconductor auxiliary coatings.
Al:Cr = 50:50	Excellent comprehensive performance, applicable to precision machinery, electronic packaging and high-temperature equipment surface protection.
Al:Cr = 70:30	High aluminum content, good electrical conductivity and ductility, suitable for conductive protective films and optoelectronic device coatings.
Al:Cr = 90:10	Mainly used for decorative and lightweight protective coatings, with good surface finish and corrosion resistance.

High-Temperature Oxidation & Corrosion Protection

Widely used to deposit oxidation-resistant and corrosion-resistant layers on cutting tools, engine components, gas turbines, and mechanical parts operating under extreme high-temperature environments.

Hard & Wear-Resistant Coatings

Applied for depositing high-hardness, low-friction, and wear-resistant films on molds, bearings, precision machinery, and automotive components to extend service life.

Optical & Functional Films

Suitable for fabricating optical coatings, solar absorber films, and decorative hard coatings with excellent optical properties and mechanical stability.

Semiconductor & Electronic Applications

Used as diffusion barrier layers, passivation films, and high-temperature stable metallization layers in microelectronic devices and packaging structures.

Research & Advanced Coating Development

Extensively employed in materials science, thin-film deposition research, and the development of high-performance protective and functional coating systems.

AlCr sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable sputtering performance, uniform film composition, and high-quality thin-film formation.
AlCr20wt%-2N8-COA