产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Cobalt Iron (CoFe) Sputtering Target
| 材料类型 | CoFe Target |
|---|---|
| 元素符号 | CoFe |
| 原子量 | 3N,3N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Cobalt Iron (CoFe) Sputtering Target Description:
The purity of cobalt-iron targets directly affects thin film performance.
High-end applications such as semiconductors typically require purity above 99.99% to minimize the impact of impurities.
Purity includes planar targets, circular targets, and irregularly shaped targets.
The application areas of cobalt-iron targets are closely related to their excellent magnetic and electrical properties,
mainly in the following aspects:
Information storage (core application):
Microelectronics and semiconductors:
Emerging high-end applications:
Synthesis of artificial diamonds (diamond):
Aerospace and medical:
CoFe50at%-3N5-COA
Related Sputtering Targets
CoCr sputtering target
CoCrNi sputtering target
CoFeB sputtering target
CoCu sputtering target
