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Copper Chromium (CuCr) Sputtering Target

材料类型	CuCr Target
元素符号	CuCr
原子量	3N,3N5
原子序数	As request
颜色/外形	Planar,Disc,Rotary etc
热导率	1-3week W/m.K
熔点	Support Customize (°C)
沸点	Support (°C)
热膨胀系数	Semiconductors, display panels, optics, solar energy, and functional coatings /K

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产品简介

Copper Chromium (CuCr) Sputtering Target Description:

Copper Chromium (CuCr) sputtering targets are high-performance alloy materials, integrating the excellent electrical conductivity, thermal conductivity and ductility of copper with the high hardness, corrosion resistance and wear resistance of chromium. They are widely used in thin film deposition fields, suitable for preparing functional films with high conductivity, wear resistance and corrosion resistance, and are core materials in semiconductor, optoelectronic, industrial and decorative coating fields. Typically manufactured by powder metallurgy process, these targets feature high density, uniform microstructure and stable sputtering performance, facilitating efficient thin film deposition.

CuCr Alloy Ratio (Core Ratio Information):

CuCr Alloy Ratio	Application Characteristics
Cu:Cr = 95:5	Most commonly used conventional ratio, suitable for general industrial and electronic applications (such as common conductive films, decorative coatings and electrical contacts). It balances conductivity and hardness, with stable sputtering performance and high cost-effectiveness, meeting basic application needs.
Cu:Cr = 90:10	High copper content, excellent electrical and thermal conductivity, suitable for mid-to-high-end electronic and optoelectronic applications (such as semiconductor auxiliary conductive layers, optoelectronic device electrodes and interconnects). It effectively ensures stable film formation and low impurity interference, improving device performance and reliability.
Cu:Cr = 60:40	Balanced copper and chromium content, excellent comprehensive performance, suitable for precision industrial coatings, reflective mirrors and optoelectronic functional films. It combines good conductivity with enhanced corrosion and wear resistance, adapting to multiple complex application scenarios.
Cu:Cr = 50:50	High chromium content, outstanding hardness and corrosion resistance, suitable for high-wear industrial components, cutting tools and high-temperature protective coatings. It can also be used for preparing p-type transparent conductive oxide films after annealing, applicable to optoelectronic devices.

Semiconductor & Microelectronics

Widely used as conductive layers, interconnection lines and diffusion barrier auxiliary layers in integrated circuits, wafers and electronic packaging, leveraging the good conductivity of copper and the stability of chromium to ensure the stable operation of electronic devices and reduce impurity interference.

Optoelectronic & Display Devices

Applied to deposit functional thin films for displays, solar cells, optoelectronic sensors and LEDs, improving the conductivity, wear resistance and light transmittance of devices, and enhancing the service life and stability of products. It can also be used to prepare p-type transparent conductive electrodes for novel optoelectronic devices.

Industrial Protective Coatings

Suitable for preparing wear-resistant, corrosion-resistant and high-temperature resistant coatings, applied to industrial machinery, precision parts, cutting tools and other fields, effectively extending the service life of equipment and reducing maintenance costs.

Decorative & Other Applications

Used for preparing decorative coatings on hardware, architectural parts and consumer electronics, with a bright surface finish and good corrosion resistance. It is also widely used in materials science research, thin film deposition experiments and special functional material preparation, meeting the high requirements of cutting-edge research and special industrial fields.

CuCr sputtering targets with different ratios are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition, uniform film thickness and high film quality, which can fully meet the application needs of different fields. They can be customized into various shapes and sizes according to actual requirements.

Related Sputtering Targets
CuAl Sputtering Target
CuB Sputtering Target
CuCr Sputtering Target
CuNi Sputtering Target