产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Iron Nickel (FeNi) Sputtering Target
| 材料类型 | FeNi Target |
|---|---|
| 元素符号 | FeNi |
| 原子量 | 2N5,3N,3N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Iron Nickel (FeNi) Sputtering Target Description:
Iron Nickel (FeNi) sputtering targets are widely used for depositing soft magnetic thin films in advanced electronic
and magnetic applications. With high magnetic permeability, low coercivity, and excellent uniformity, FeNi alloys are ideal for precision functional coatings.
Magnetic Thin Films:
FeNi targets are commonly used to produce soft magnetic layers for sensors, inductors, and thin film magnetic devices.
Semiconductor & Microelectronics:
Applied as seed layers and functional magnetic materials in integrated circuits and MEMS devices.
Data Storage:
Used in magnetic recording media and components for hard disk drives and data storage technologies.
Sensors & Electromagnetic Shielding:
Suitable for magnetic sensors and EMI shielding coatings due to their excellent magnetic response.
Research Applications:
Widely used in spintronics and advanced thin film research.
FeNi sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring.
FeNi30wt%-3N5-COA
Related Sputtering Targets
FeNi Sputtering Target
FeNiCo Sputtering Target
FeCo Sputtering Target
NiCr Sputtering Target
