产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Nickel Titanium (NiTi) Sputtering Target
| 材料类型 | NiTi Target |
|---|---|
| 元素符号 | NiTi |
| 原子量 | 3N,3N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Nickel Titanium (NiTi) Sputtering Target Description:
Nickel-titanium sputtering targets are classified by composition, with the most crucial basis being the atomic ratio of
nickel and titanium. Even minute variations in composition significantly affect the phase transition temperature of the alloy,
thus determining whether it exhibits a "shape memory effect" or "superelasticity."
Nickel-titanium 50/50at%
Nickel-titanium 55/45at%
Nickel-titanium 90/10wt%
Copper-nickel-titanium 62/35/3wt%
Purity directly affects the quality and performance of the thin film, especially in precision electronics and medical fields:
Industrial pure (2N - 3N): Purity approximately 99% - 99.9%, used for general industrial wear-resistant and protective coatings.
High purity (3N5 - 4N): With a purity of 99.95% - 99.99% or higher, it is the mainstream choice for coating semiconductors,
MEMS micro-actuators, and high-end medical implants.
Main Application Areas: The applications of nickel-titanium alloy targets mainly revolve around their two unique functions:
1. Biomedical field
2. Aerospace and industrial field
3. Microelectronics and microelectromechanical systems
TiNiAlCu-3N5-COA
Related Sputtering Targets
NiCu sputtering target
