产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Ceramic Evaporation Materials
| 材料类型 | Ceramic Materials |
|---|---|
| 元素符号 | / |
| 原子量 | As request |
| 原子序数 | As request |
| 颜色/外形 | Pellet,Granules,Lump,Cube |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
We supply a comprehensive range of high-performance ceramic materials designed for precision thin film deposition. Our products are widely used in semiconductor, optics, electronics, energy, and coating industries.
With strict control over purity, density, and microstructure, our ceramic evaporation materials ensure stable sputtering performance, excellent film quality, and long service life.
Available Materials
We offer a broad portfolio of oxide, nitride, carbide, boride, and compound ceramic materials:
Oxide Ceramics
SrTiO3 (Strontium Titanate)
BaTiO3 (Barium Titanate)
Fe2O3 (Iron Oxide)
NiO (Nickel Oxide)
In2O3 (Indium Oxide)
MgO (Magnesium Oxide)
Ta2O5 (Tantalum Oxide)
Nb2O5 (Niobium Oxide)
HfO2 (Hafnium Oxide)
Al2O3 (Aluminum Oxide)
ZnO (Zinc Oxide)
TiO2 (Titanium Dioxide)
SiO2 (Silicon Dioxide)
Carbides
TaC (Tantalum Carbide)
NbC (Niobium Carbide)
HfC (Hafnium Carbide)
SiC (Silicon Carbide)
Nitrides
TaN (Tantalum Nitride)
NbN (Niobium Nitride)
CrN (Chromium Nitride)
TiN (Titanium Nitride)
BN (Boron Nitride)
Borides
TiB2 (Titanium Diboride)
ZrB2 (Zirconium Diboride)
Composite / Special Ceramics
B4C (Boron Carbide)
Key Features
High Purity: Up to 99.99% for critical applications
High Density: ≥ 98% theoretical density for stable sputtering
Uniform Microstructure: Ensures consistent film deposition
Customizable Sizes: Lump, Granules, Pellets,Cube,etc
The primary application of ceramic evaporation materials is as a core heating element or container in vacuum evaporation
processes. Through its own electrical conductivity, it heats and melts metals such as aluminum and copper,
causing them to evaporate and deposit uniformly onto the surface of substrates like plastics, paper, and glass,
forming an extremely thin metallic film.
Specifically, it mainly serves the coating production in the following fields:
Packaging Materials: Aluminum film is deposited on plastic or paper packaging for food and pharmaceuticals to
block oxygen and moisture, extending shelf life.
Electronic Components: Used in the manufacture of metallized coatings for capacitors, multilayer capacitors,
and the metallization of integrated circuits.
Decoration and Anti-counterfeiting: Used in the production of hot stamping film, anti-counterfeiting marks,
coatings for high-end packaging boxes, and reflective coatings for products such as automotive lights.
Display and Optics: Used in the coating manufacturing of displays.







