Chromium (Cr) Sputtering Target Description:

Chromium Target has different purity: 2N5,3N,3N5,4N

Chromium planar targets: mostly plate-shaped or disc-shaped, manufactured using hot-pressing sintering, 

resulting in high density, low oxygen content, and excellent film uniformity.

Suitable for applications requiring extremely high precision, such as semiconductor packaging, 

high-end electronic components, and precision optical coating.

Chromium rotating targets: typically tubular, manufactured using spraying or hot isostatic pressing processes, 

allowing for longer dimensions (up to 4000mm), high material utilization, and suitability for large-area, continuous, 

and mass production.

Widely used in large-area coating applications such as architectural glass, photovoltaic electrodes, and decorative coatings.

Chromium targets have a wide range of applications, covering almost every aspect from basic industries to 

cutting-edge technologies:

Semiconductors and Microelectronics: Used in chip manufacturing to form adhesion layers, 

barrier layers, and electrode layers, preventing copper diffusion and enhancing circuit reliability.

Decorative and Functional Coatings: Give products such as watches, mobile phone casings, 

and hardware a bright metallic luster, while providing excellent wear resistance and corrosion protection.

Hard Coatings and Tooling: Depositing chromium or chromium nitride (CrN) hard films on components such as 

cutting tools, molds, and automotive piston rings significantly improves their wear resistance and extends their service life.

Other High-End Applications: Also widely used in electrodes for solar photovoltaic cells, heat insulation films for 

energy-efficient building glass, beam-splitting films for optical devices, and magnetic thin films for data storage.

Cr-3N5-COA

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