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Aluminum Copper (AlCu) Sputtering Target

材料类型	AlCu Target
元素符号	AlCu
原子量	5N, 5N5
原子序数	As request
颜色/外形	Planar,Disc,Rotary etc
热导率	1-3week W/m.K
熔点	Support Customize (°C)
沸点	Support (°C)
热膨胀系数	Semiconductors, display panels, optics, solar energy, and functional coatings /K

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产品简介

Aluminum Copper (AlCu) Sputtering Target Description:

Aluminum Copper (AlCu) sputtering targets are essential binary alloy materials designed for depositing

high-performance aluminum-copper composite thin films in a wide range of advanced electronic, semiconductor,

and industrial applications. By incorporating copper into the aluminum matrix, these targets offer enhanced

mechanical strength, improved thermal stability, and superior electrical conductivity, making them a preferred choice for demanding coating requirements.

With excellent adhesion properties, low residual stress, and uniform film deposition characteristics,

AlCu alloy targets are ideally suited for crafting functional coatings that deliver exceptional reliability and performance in harsh operating environments.

Semiconductor & Interconnect Materials

Widely employed as diffusion barrier layers, seed layers, and low-resistance interconnects in integrated

circuits (ICs) and semiconductor packaging. The AlCu film's excellent electromigration resistance ensures stable signal transmission and long-term device reliability.

Thermal & Heat Dissipation Coatings

Used to deposit high-conductivity thermal interface layers on power electronic modules, LED components,

and aerospace systems, facilitating efficient heat dissipation and ensuring operational

stability under high loads.

Protective & Wear-Resistant Surfaces

Applied to create hard, corrosion-resistant, and wear-enhancing coatings on automotive parts, precision

machinery, and optical components, extending service life and maintaining surface integrity in challenging conditions.

Thin-Film Electronics & Sensors

Ideal for fabricating sensitive layers in pressure sensors, Hall effect sensors, and thin-film resistor networks,

leveraging the alloy's stable electrical and mechanical properties for high-precision measurements.

Research & Advanced Coating Development

Widely utilized in materials science research and thin-film development laboratories for studying alloy deposition

mechanisms, interface engineering, and the development of next-generation functional coatings.

AlCu sputtering targets are fully compatible with DC and RF magnetron sputtering systems, providing stable

sputtering performance, consistent film composition, and high-purity coatings that meet the most stringent industry standards.

AlCu30wt%-4N-COA
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