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Aluminum Titanium Silicon (AlTiSi) Sputtering Target

材料类型	AlTiSi Target
元素符号	AlTiSi
原子量	3N
原子序数	As request
颜色/外形	Planar,Disc,Rotary etc
热导率	1-3week W/m.K
熔点	Support Customize (°C)
沸点	Support (°C)
热膨胀系数	Semiconductors, display panels, optics, solar energy, and functional coatings /K

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产品简介

Aluminum Titanium Silicon (AlTiSi) Sputtering Target Description:

Aluminum Titanium Silicon (AlTiSi) sputtering targets are high-performance ternary alloy materials widely used for depositing high-performance protective, barrier, and high-temperature resistant thin films in advanced electronic, optical, and industrial applications. With excellent oxidation resistance, thermal stability, strong adhesion, low internal stress, and uniform film formation, AlTiSi ternary alloys are ideal for high-durability functional coatings.

High-Temperature Protective Coatings

AlTiSi targets are commonly used to deposit oxidation and corrosion-resistant layers for cutting tools, engine components, and surface protection under extreme environments.

Semiconductor & Microelectronics

Applied as diffusion barrier layers, encapsulation films, and passivation coatings in integrated circuits, wafers, and electronic packaging.

Optical & Protective Films

Used for fabricating durable optical coatings, anti-reflection films, and hard protective layers with high thermal and mechanical stability.

Thin-Film Encapsulation & Barrier Materials

Suitable for gas barrier films, moisture-resistant coatings, and insulating layers in display and optoelectronic devices.

Research & Advanced Coating Development

Widely used in materials science, thin-film deposition, and high-performance coating research.

AlTiSi sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition and high-quality thin films.

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