产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Niobium (Nb) Sputtering Target
| 材料类型 | Nb Target |
|---|---|
| 元素符号 | Nb |
| 原子量 | 3N |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Niobium (Nb) Sputtering Target Description:
Niobium (Nb) sputtering targets are high-purity functional materials, mainly used for depositing high-temperature resistant, corrosion-resistant thin films. They have excellent thermal stability, good adhesion and chemical inertness, and are widely applied in semiconductor, aerospace, electronic packaging and other fields, suitable for preparing functional coatings and barrier layers with high reliability.
Purity Specification:
Niobium (Nb) sputtering targets are high-purity functional materials, mainly used for depositing high-temperature resistant, corrosion-resistant thin films. They have excellent thermal stability, good adhesion and chemical inertness, and are widely applied in semiconductor, aerospace, electronic packaging and other fields, suitable for preparing reliable functional coatings and barrier layers.
Purity Specification:
Purity Grade | Application Characteristics |
3N5 (99.95%) | The most commonly used conventional purity grade, suitable for most industrial coating applications, such as general electronic components, common protective films and other scenarios, with stable performance and cost-effectiveness. |
Semiconductor & Microelectronics
Applied as diffusion barrier layers and conductive layers in integrated circuits, effectively improving device stability and reducing impurity interference.
Aerospace & High-Temperature Equipment
Widely used to deposit high-temperature resistant and corrosion-resistant coatings on aerospace components and high-temperature industrial equipment, maintaining structural integrity under extreme working conditions.
Scientific Research & Precision Applications
Applied in materials science research, thin-film deposition experiments and high-precision electronic component manufacturing, meeting the high-purity requirements of cutting-edge technology fields.
Niobium sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition, uniform film composition and high-quality thin-film formation, which can fully meet the application needs of different fields.
Semiconductor & Microelectronics
Applied as diffusion barrier layers and conductive layers in integrated circuits, magnetic sensors and electronic packaging, effectively improving device stability and service life, and reducing impurity interference.
Aerospace & High-Temperature Equipment
Widely used to deposit high-temperature resistant and corrosion-resistant coatings on aerospace components and high-temperature industrial equipment, maintaining structural integrity under extreme working conditions.
Scientific Research & Precision Applications
Applied in materials science research, thin-film deposition experiments and high-precision electronic component manufacturing, meeting the high-purity requirements of cutting-edge technology fields.
Niobium sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition, uniform film composition and high-quality thin-film formation, which can fully meet the application needs of different fields.
Related Sputtering Targets
NbTi Sputtering Target
NbCr Sputtering Target
NbNi Sputtering Target
NiMo Sputtering Target
Nb Sputtering Target
