产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Aluminum Silicon (AlSi) Sputtering Target
| 材料类型 | AlSi Target |
|---|---|
| 元素符号 | AlSi |
| 原子量 | 5N, 5N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Aluminum Silicon (AlSi) Sputtering Target Description:
Aluminum Silicon (AlSi) sputtering targets are high-performance binary alloy materials widely used for
depositing uniform, high-quality thin films in advanced semiconductor, electronic, and optoelectronic
applications. Combining the excellent electrical conductivity of aluminum with the outstanding thermal
stability and diffusion barrier properties of silicon, AlSi alloys deliver superior performance in advanced
interconnect and coating technologies.
With low residual stress, strong adhesion, excellent corrosion resistance, and stable deposition behavior,
AlSi sputtering targets are ideal for manufacturing high-reliability electronic thin films and functional coatings.
Semiconductor & Integrated Circuits
Widely used as interconnect layers, contact metallization, and barrier layers in integrated circuits, wafers,
and semiconductor devices, effectively suppressing diffusion and ensuring long-term device stability.
Electronic Packaging & Assembly
Applied in thin-film packaging, solderable coatings, and metallization layers for electronic components,
providing excellent weldability and electrical contact performance.
Optoelectronic & Display Devices
Used for fabricating conductive and protective layers in display panels, optoelectronic modules, and
photovoltaic devices, ensuring stable performance under diverse operating conditions.
Thin-Film Resistors & Conductive Structures
Suitable for manufacturing precision thin-film resistors, conductive paths, and microelectronic circuits
with controlled resistivity and high structural stability.
Research & Advanced Thin-Film Development
Extensively employed in materials science, thin-film deposition research, and the development of
next-generation microelectronic devices and coating systems.
AlSi sputtering targets are compatible with DC and RF magnetron sputtering systems, guaranteeing
stable sputtering, uniform film composition, and high-quality thin-film formation for industrial and research applications.
AlSi1wt%-4N-COA
Related Sputtering Targets
Al Sputtering Target
AlSnCu Sputtering Target
AlTiSi Sputtering Target
AlV Sputtering Target
AlCr Sputtering Target
AlTi Sputtering Target
AlSi Sputtering Target
AlCu Sputtering Target
