产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Tantalum (Ta) Sputtering Target
| 材料类型 | Ta Target |
|---|---|
| 元素符号 | Ta |
| 原子量 | 3N5,4N |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Tantalum (Ta) Sputtering Target Description:
Tantalum (Ta) sputtering targets are high-purity metallic materials, mainly used for depositing high-performance tantalum thin films with excellent chemical inertness, high melting point, and good electrical conductivity. The purity of the target is 3N5-4N (99.95%-99.99%), which can meet the requirements of different precision sputtering applications and ensure the stability and reliability of the deposited thin films.
With excellent chemical stability, high temperature resistance, strong adhesion, and uniform film formation performance, pure tantalum sputtering targets are widely used in semiconductor, optoelectronic, aerospace, and chemical industrial fields, providing reliable support for the preparation of high-quality functional thin films.
Semiconductor & Microelectronics
Applied as diffusion barrier layers, contact metallization, and passivation coatings in integrated circuits and wafers. The high-purity tantalum thin films effectively prevent interdiffusion between metal layers, improving the service life and stability of electronic devices.
High-Temperature Protective Coatings
Used to deposit high-temperature resistant and oxidation-resistant thin films on aerospace components, high-temperature industrial equipment, and precision machinery, maintaining structural integrity under extreme thermal environments.
Corrosion-Resistant Applications
Suitable for fabricating corrosion-resistant coatings in chemical processing equipment, fuel cells, and other harsh chemical environments, resisting erosion from strong acids, alkalis, and other corrosive media.
Optical & Optoelectronic Devices
Used in the preparation of high-stability optical coatings, reflective layers, and electrode materials for optoelectronic devices, ensuring stable performance and uniform light transmission.
Research & Development
Widely used in materials science research, thin-film deposition experiments, and the development of next-generation electronic and industrial coating systems.
Tantalum sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition, uniform film thickness, and consistent performance, which is the core material for high-reliability thin-film preparation.
Related Sputtering Targets
TaAl Sputtering Target
TaW Sputtering Target
TaNb Sputtering Target
TaMo Sputtering Target
TaTi Sputtering Target
Ta Sputtering Target
