Nickel Iron (NiFe) Sputtering Target Description:

1. Classification by Composition

Low-nickel alloys (e.g., NiFe 10%, 20%): Typically possess high saturation magnetic induction, 

suitable for magnetic components with specific requirements.

Permalloy series (e.g., NiFe 50%, 80%): This is the most classic soft magnetic material.

NiFe 50%: Offers the highest bias performance, suitable for high-power, high-DC bias applications.

NiFe 80%: Exhibits extremely high permeability (10-20 times higher than silicon steel) 

and extremely low coercivity in weak magnetic fields, ideal for magnetic shielding and sensitive relays.

2. Classification by Shape

Targets can be processed into different shapes according to the requirements of sputtering equipment:

Planar targets: The most common square or round targets.

Rotating targets: Tubular structure, with higher material utilization.

Irregularly shaped targets: Custom shapes based on special equipment.

3. Classification by Purity

Purity directly affects the performance of thin films, especially electrical stability and corrosion resistance:

Industrial Pure (2N-3N): Used for general industrial coatings.

High Purity (3N-5-4N): Such as 99.95% and above, the standard requirement for semiconductors and 

high-end magnetic recording media.

Main Application Areas

Ni-iron sputtering targets utilize their soft magnetic properties to deposit materials into thin films primarily 

through magnetron sputtering technology. Specific applications include:

Data Storage: Read heads, write heads, and storage media for hard disk drives (HDDs)

Magnetic Sensors: Magnetoresistive sensors, Hall effect sensors

Electronic Components: High-frequency transformers, inductors, current transformers

Magnetic Shielding: Shielding covers for precision instruments and electronic equipment

NiFe20wt%-3N5-COA

Related Sputtering Targets

NiCu sputtering target