产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Niobium Molybdenum (NbMo) Sputtering Target
| 材料类型 | NbMo Target |
|---|---|
| 元素符号 | NbMo |
| 原子量 | 3N |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Niobium Molybdenum (NbMo) Sputtering Target Description:
Niobium Molybdenum (NbMo) sputtering targets are high-performance binary alloy materials widely used for depositing high-temperature resistant, corrosion-resistant and wear-resistant thin films. They are suitable for advanced electronic, aerospace, and industrial coating applications, with excellent thermal stability, mechanical strength, and adhesion, making them ideal for functional coatings and precision component protection.
Common ratio:
Common Ratio (NbMo, wt% or at%) | Application Characteristics |
Nb:Mo = 10:90 | High molybdenum content, excellent high-temperature resistance and wear resistance, suitable for high-temperature industrial equipment coatings and cutting tool protective films. |
Nb:Mo = 20:80 | Balanced high-temperature performance and corrosion resistance, widely applied in aerospace components and high-temperature electronic device coatings. |
Nb:Mo = 30:70 | Good mechanical strength and thermal conductivity, suitable for semiconductor auxiliary films and precision industrial component coatings. |
Nb:Mo = 50:50 | Excellent comprehensive performance, balanced corrosion resistance and high-temperature stability, applicable to harsh environment coatings and aerospace precision components. |
Nb:Mo = 70:30 | High niobium content, good ductility and chemical inertness, suitable for electronic device barrier layers and low-temperature protective coatings. |
Nb:Mo = 90:10 | Mainly used for corrosion-resistant and high-purity coatings, suitable for high-precision electronic components and scientific research applications. |
Semiconductor & Microelectronics
Applied as diffusion barrier layers, conductive metallization layers and protective films in integrated circuits, magnetic sensors and electronic packaging, effectively improving device stability and service life.
Aerospace & High-Temperature Equipment
Widely used to deposit high-temperature resistant and corrosion-resistant coatings on aerospace components, engine parts and high-temperature industrial equipment, maintaining structural integrity under extreme working conditions.
Industrial Protective Coatings
Suitable for fabricating wear-resistant and corrosion-resistant coatings on industrial machinery, molds and precision parts, extending the service life of equipment and reducing maintenance costs.
Research & Advanced Coating Development
Widely used in materials science research, thin-film deposition experiments and the development of next-generation high-performance coating systems, meeting the diverse needs of different application fields.
NbMo sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition, uniform film composition and high-quality thin-film formation, which can fully meet the application requirements of various harsh and precision scenarios.
Related Sputtering Targets
NbTi Sputtering Target
NbCr Sputtering Target
NbNi Sputtering Target
NiMo Sputtering Target
Nb Sputtering Target
