产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Cobalt Chromium (CoCr) Sputtering Target
| 材料类型 | CoCr Target |
|---|---|
| 元素符号 | CoCr |
| 原子量 | 3N,3N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Cobalt Chromium (CoCr) Sputtering Target Description:
Cobalt-chromium (Co-Cr) alloy targets are highly versatile functional materials.
They cleverly combine the magnetism of cobalt with the corrosion resistance and hardness of chromium,
forming a unique "magnetic-mechanical" combination. Therefore, they have important applications in a wide range of fields,
from information storage to biomedicine and aerospace.
Cobalt-chromium alloy target composition classification: 80/20 wt% cobalt-chromium
Shape classification: Planar targets, circular targets, cylindrical targets, irregularly shaped targets
Main application areas:
Information storage (core application)
Biomedicine
Aerospace and energy
Industrial and consumer products (wear-resistant and corrosion-resistant components; jewelry and ornaments)
CoCr-3N5-COA
Related Sputtering Targets
CoCr sputtering target
CoCrNi sputtering target
CoFeB sputtering target
CoCu sputtering target
