Chromium Silicon (CrSi) Sputtering Target Description:

Chromium-silicon targets are an important branch extending from chromium targets into the field of 

high-end functional thin films. By adding silicon to chromium, the resulting CrSi alloy targets can generate composite 

coatings such as CrSiN, CrSiC, and CrSiO during reactive sputtering. Their core advantage lies in the fact that the introduction 

of silicon significantly refines the grain size, improves hardness, and optimizes tribological properties, 

making them a key material for achieving ultra-hard, low-friction, and high-resistance functional thin films.

Our company produces the following chromium-silicon alloy targets:

Cr85Si 15at%, Cr90Si 10at%, Cr95Si 0.5at%

CrSi90/10wt%, CrSi50/50wt%, CrSi25/75wt%

Chromium-silicon planar targets: mostly rectangular or circular plates, produced using powder metallurgy hot pressing (HIP) 

or spark plasma sintering (SPS) processes, resulting in high density (≥99%), fine grains (≤100μm), and good film uniformity.

Chromium-silicon rotating target: Tubular shape, high material utilization, enabling continuous and stable production, 

suitable for large-scale industrial coating.

Core Application Areas

(1) Superhard Wear-Resistant Coating (Core Application)

Application Scenarios: Drill bits, milling cutters, blades, precision molds, stainless steel mobile phone cases, watch cases.

(2) High-Resistance Thin Films

Application Scenarios: Precision thin film resistors, passive components in integrated circuits.

(3) Semiconductors and Microelectronics

Application Scenarios: Gates, electrodes, barrier layers, interconnect materials in semiconductor devices.

(4) Decorative and Functional Coatings

Application Scenarios: Black or dark gray decorative coatings for watch and mobile phone cases, hardware parts.

CrSi20at%-2N8-COA

Related Sputtering Targets