产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Tantalum Molybdenum (TaMo) Sputtering Target
| 材料类型 | TaMo Target |
|---|---|
| 元素符号 | TaMo |
| 原子量 | 3N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Tantalum Molybdenum (TaMo) Sputtering Target Description:
Tantalum Molybdenum (TaMo) sputtering targets are high-performance binary alloy materials widely used for depositing high-performance barrier, protective, and high-temperature resistant thin films in advanced electronic, optical, and industrial applications. With excellent oxidation resistance, thermal stability, strong adhesion, low internal stress, and uniform film formation, TaMo binary alloys are ideal for high-durability functional coatings.
High-Temperature Protective Coatings
TaMo targets are commonly used to deposit oxidation and corrosion-resistant layers for cutting tools, engine components, and surface protection under extreme environments.
Semiconductor & Microelectronics
Applied as diffusion barrier layers, encapsulation films, and passivation coatings in integrated circuits, wafers, and electronic packaging.
Optical & Protective Films
Used for fabricating durable optical coatings, anti-reflection films, and hard protective layers with high thermal and mechanical stability.
Thin-Film Encapsulation & Barrier Materials
Suitable for gas barrier films, moisture-resistant coatings, and insulating layers in display and optoelectronic devices.
Research & Advanced Coating Development
Widely used in materials science, thin-film deposition, and high-performance coating research.
TaMo sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition and high-quality thin films.
Related Sputtering Targets
TaAl Sputtering Target
TaW Sputtering Target
TaNb Sputtering Target
TaMo Sputtering Target
TaTi Sputtering Target
Ta Sputtering Target
