产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Aluminum Titanium (AlTi) Sputtering Target
| 材料类型 | AlTi Target |
|---|---|
| 元素符号 | AlTi |
| 原子量 | 3N |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Aluminum Titanium (AlTi) Sputtering Target Description:
Aluminum Titanium (AlTi) sputtering targets are high-performance binary alloy materials widely used for depositing high-quality thin films in advanced semiconductor, electronic, and industrial coating applications. Integrating the excellent electrical conductivity of aluminum with the exceptional thermal stability, oxidation resistance, and barrier properties of titanium, AlTi alloys provide outstanding performance for high-reliability metallization and protective coatings.
With strong adhesion, low internal stress, excellent corrosion resistance, and uniform film formation, AlTi sputtering targets are ideal for fabricating high-performance functional films and barrier layers.
Semiconductor & Microelectronics
Widely applied as diffusion barrier layers, contact metallization, and adhesive layers in integrated circuits, wafers, and electronic packaging, effectively inhibiting interdiffusion and improving device stability and lifespan.
Barrier & Adhesion Layers
Used as high-performance barrier and adhesion-promoting layers between different materials, enhancing interface bonding and preventing element migration in multilayer film structures.
Protective & High-Temperature Coatings
Suitable for depositing oxidation-resistant, wear-resistant, and high-temperature stable coatings on mechanical components, molds, and aerospace parts.
Optoelectronic & Display Devices
Applied in conductive and barrier layers for display panels, optoelectronic modules, and photovoltaic devices, ensuring excellent stability and durability.
Research & Advanced Coating Development
Extensively used in materials science, thin-film deposition research, and the development of next-generation microelectronic and coating systems.
AlTi sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable sputtering behavior, uniform composition, and high-quality thin-film deposition.
TiAl50_50at%-2N7-COA
Related Sputtering Targets
Al Sputtering Target
AlSnCu Sputtering Target
AlTiSi Sputtering Target
AlV Sputtering Target
AlCr Sputtering Target
AlTi Sputtering Target
AlSi Sputtering Target
AlCu Sputtering Target
