产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Cobalt Aluminum (CoAl) Sputtering Target
| 材料类型 | CoAl Target |
|---|---|
| 元素符号 | CoAl |
| 原子量 | 2N5,3N,3N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Cobalt Aluminum (CoAl) Sputtering Target Description:
Cobalt-aluminum (Co-Al) alloy targets are a type of specialized alloy target with a more defined application focus:
the fabrication of high-performance thin film materials.
Cobalt-aluminum 82/18wt%
Cobalt-aluminum 1:2at%
The applications of cobalt-aluminum targets are highly concentrated in the microelectronics field, playing a crucial role,
especially in advanced chip manufacturing:
Advanced semiconductor interconnects and barrier layers: This is the most cutting-edge and core application
direction of cobalt-aluminum targets.
Furthermore, it may also be studied for use as metal gate electrodes in some special devices.
CoAl18wt%-3N-COA
Related Sputtering Targets
CoCr sputtering target
CoCrNi sputtering target
CoFeB sputtering target
CoCu sputtering target
