产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Aluminum Vanadium (AlV) Sputtering Target
| 材料类型 | AlV Target |
|---|---|
| 元素符号 | AlV |
| 原子量 | 3N |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Aluminum Vanadium (AlV) Sputtering Target Description:
Aluminum Vanadium (AlV) sputtering targets are high-performance binary alloy materials widely used for depositing high-quality thin films with excellent thermal stability, corrosion resistance, and strong interfacial adhesion in advanced electronic, industrial, and optical applications. Combining the high electrical conductivity of aluminum with the excellent high-temperature stability, oxidation resistance, and barrier properties of vanadium, AlV alloys provide reliable performance for functional coatings and metallization layers in demanding working environments.
With low internal stress, uniform film formation, good sputtering stability, and strong compatibility with various substrates, AlV sputtering targets are ideal for preparing high-reliability thin-film materials and protective coatings.
Semiconductor & Microelectronics
Widely used as diffusion barrier layers, adhesive layers, and metallization coatings in integrated circuits, wafers, and electronic packaging, effectively inhibiting element interdiffusion and improving device reliability and service life.
High-Temperature Protective Coatings
Suitable for depositing oxidation-resistant and corrosion-resistant films on aerospace components, engine parts, and high-temperature industrial devices, maintaining structural stability under extreme thermal environments.
Optical & Functional Thin Films
Applied in the preparation of optical films, reflective layers, and durable functional coatings with stable optical and mechanical properties.
Thin-Film Electrodes & Interconnect Structures
Used for fabricating conductive electrodes and interconnect layers with good thermal stability and low contact resistance in electronic and optoelectronic devices.
Research & Advanced Coating Development
Extensively employed in materials science research, thin-film deposition technology, and the development of next-generation electronic and coating materials.
AlV sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable sputtering behavior, uniform composition distribution, and high-quality thin-film deposition.
Related Sputtering Targets
Al Sputtering Target
AlSnCu Sputtering Target
AlTiSi Sputtering Target
AlV Sputtering Target
AlCr Sputtering Target
AlTi Sputtering Target
AlSi Sputtering Target
AlCu Sputtering Target
