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Tin Zinc (SnZn) Sputtering Target

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Tin Zinc (SnZn) Sputtering Target

材料类型 SnZn Target
元素符号 SnZn
原子量 3N5,4N
原子序数 As request
颜色/外形 Planar
热导率 1-3week W/m.K
熔点 Support Customize (°C)
沸点 Support (°C)
热膨胀系数 Semiconductors, display panels, optics, solar energy, and functional coatings /K
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产品简介

Tin Zinc (SnZn) Sputtering Target Description:


Zinc-tin (ZnSn) alloy sputtering targets are used in physical vapor deposition processes such as magnetron sputtering, 

combining the high transmittance of zinc with the chemical stability of tin. 

The main applications of zinc-tin sputtering targets are transparent conductive films and photovoltaic devices.


The most common type of zinc-tin sputtering target. 

The commonly used ratio is zinc:tin ≈ 52:48 (atomic ratio), 

which yields the best overall optoelectronic performance for the thin film. 

Targets with different ratios can also be customized according to customer requirements.


Including: 

SnZn 60/40wt%

SnZn 50/50wt%

SnZn 91.2/8.8wt% 

Various sizes can be customized.


Thin films deposited using zinc-tin alloy sputtering targets exhibit high transmittance, low resistivity, 

and excellent environmental stability. Their visible light transmittance can reach 85%–90%, 

and the resistivity is stable at the 10⁻⁴ Ω·cm level. Commonly used in:

Photovoltaic industry

Display panels and touch screens

Optical coatings

Architectural and automotive glass

Electronic and optoelectronic devices


SnZn50at%-3N5-COA

SnZn50at3n5.jpg

Related Sputtering Targets


SnAgCu sputtering target


ZnSn sputtering target


Nb3Sn sputtering target


SnO2 sputtering target




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