产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Cobalt Nickel (CoNi) Sputtering Target
| 材料类型 | CoNi Target |
|---|---|
| 元素符号 | CoNi |
| 原子量 | 2N5,3N,3N5 |
| 原子序数 | As request |
| 颜色/外形 | Planar,Disc,Rotary etc |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Cobalt Nickel (CoNi) Sputtering Target Description:
The cobalt-nickel sputtering targets are available in standard purity (99.9%), high purity (99.95%-99.99%),
and ultra-high purity (≥99.999%). The cobalt:nickel ratio can be adjusted according to application requirements.
Common ratios include Co:Ni = 80:20 and 85:15.
CoNi50/50at%;CoNi50/50wt%; CoNi64/36at% etc
Microelectronics and Semiconductor Industry: This is one of the core application areas for cobalt-nickel sputtering targets.
They are used to manufacture thin-film resistors and diffusion barrier layers in integrated circuits,
as well as magnetic thin films in magnetic memory devices (such as magnetic sensors and MRAM).
Decorative coatings are used for surface treatment of products such as jewelry and mobile phones.
High-quality cobalt-nickel sputtering targets are typically prepared using vacuum melting processes to
ensure high uniformity of alloy composition, high density, and fine grain structure,
which is crucial for obtaining high-performance sputtered thin films.
CoNi70/30at%-3N5-COA
Related Sputtering Targets
CoCr sputtering target
CoCrNi sputtering target
CoFeB sputtering target
CoCu sputtering target
