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Iron Cobalt (FeCo) Sputtering Target


材料类型 FeCo Target
元素符号 FeCo
原子量 2N5,3N,3N5
原子序数 As request
颜色/外形 Planar,Disc,Rotary etc
热导率 1-3week W/m.K
熔点 Support Customize (°C)
沸点 Support (°C)
热膨胀系数 Semiconductors, display panels, optics, solar energy, and functional coatings /K
产品简介

Iron Cobalt (FeCo) Sputtering Target:

Iron Cobalt (FeCo) sputtering targets are widely used for depositing high-performance magnetic 

thin films in advanced electronic and industrial applications. With exceptionally high saturation magnetization,

 high Curie temperature, and excellent magnetic performance, FeCo alloys are ideal for demanding environments.


High-Performance Magnetic Films:

FeCo targets are used to produce high saturation magnetic layers for high-frequency devices and power electronics.


Data Storage:

Applied in high-density magnetic recording media and advanced data storage systems.


Semiconductor & Microelectronics:

Used in integrated circuits, MEMS devices, and thin film inductors requiring strong magnetic performance.


Sensors & Actuators:

Suitable for magnetic sensors and actuator components due to their superior magnetic response.


Aerospace & Defense:

Utilized in high-performance magnetic components operating under extreme conditions.


Research Applications:

Widely used in advanced magnetic materials research and spintronics.

FeCo sputtering targets are compatible with DC and RF magnetron sputtering systems, ensuring stable deposition in both industrial production and R&D applications.

FeCo50wt%-3N5-COA
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