We supply a comprehensive range of high-performance ceramic sputtering targets designed for precision thin film deposition. Our products are widely used in semiconductor, optics, electronics, energy, and coating industries.

With strict control over purity, density, and microstructure, our ceramic targets ensure stable sputtering performance, excellent film quality, and long service life.

Available Materials

We offer a broad portfolio of oxide, nitride, carbide, boride, and compound ceramic targets:

Oxide Ceramics

• SrTiO3 (Strontium Titanate)

• BaTiO3 (Barium Titanate)

• Fe2O3 (Iron Oxide)

• NiO (Nickel Oxide)

• In2O3 (Indium Oxide)

• MgO (Magnesium Oxide)

• Ta2O5 (Tantalum Oxide)

• Nb2O5 (Niobium Oxide)

• HfO2 (Hafnium Oxide)

• Al2O3 (Aluminum Oxide)

• ZnO (Zinc Oxide)

• TiO2 (Titanium Dioxide)

• SiO2 (Silicon Dioxide)

Carbides

• TaC (Tantalum Carbide)

• NbC (Niobium Carbide)

• HfC (Hafnium Carbide)

• SiC (Silicon Carbide)

Nitrides

• TaN (Tantalum Nitride)

• NbN (Niobium Nitride)

• CrN (Chromium Nitride)

• TiN (Titanium Nitride)

• BN (Boron Nitride)

Borides

• TiB2 (Titanium Diboride)

• ZrB2 (Zirconium Diboride)

Composite / Special Ceramics

• B4C (Boron Carbide)

Key Features

• High Purity: Up to 99.99% for critical applications

• High Density: ≥ 98% theoretical density for stable sputtering

• Uniform Microstructure: Ensures consistent film deposition

• Customizable Sizes: Planar, rotary, bonded targets available

• Excellent Adhesion: Compatible with various backing plates (Cu, Ti, etc.)

Applications

Our ceramic sputtering targets are widely used in:

• Semiconductors: Dielectric and barrier layers

• Optical Coatings: Anti-reflective, high-reflective films

• Display Technology: TFT, OLED coatings

• Energy Devices: Solar cells, fuel cells

• Wear-Resistant Coatings: Hard coatings for tools and components