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Cobalt Chromium Iron Nickel (CoCrFeNi) Sputtering Target


材料类型 CoCrFeNi Target
元素符号 CoCrFeNi
原子量 3N
原子序数 As request
颜色/外形 Planar
热导率 1-3week W/m.K
熔点 Support Customize (°C)
沸点 Support (°C)
热膨胀系数 Semiconductors, display panels, optics, solar energy, and functional coatings /K
产品简介

Cobalt Chromium Iron Nickel (CoCrFeNi) Sputtering Target Description:


Cobalt-Cr-Fe-Ni Alloy Target Material


Common Ratio: Co:Cr:Fe:Ni = 1:1:1:1at%


Size:

Planar Target: Traditional flat target material, the most widely used.


Irregularly Shaped Target: Customized shapes according to customer needs, such as discs, rods, granules, etc.


Purity: 3N, 3N5


Applications:

Semiconductor Manufacturing: Conductive layers, barrier layers, electrode layers, used to prepare key thin-film structures 

in advanced process chips.


Magnetic Recording Technology: Hard disk magnetic recording films, used to manufacture magnetic films in hard disk drives, 

enabling high-density data storage.


Magnetic Storage Devices: Magnetic heads, magnetic sensors, utilizing their soft magnetic properties to manufacture 

high-performance magnetic heads and sensors.


Optics: Thin films with special optical properties, used to prepare coatings with specific optical characteristics.


Electronics Industry: Resistors, capacitors, electronic components, used for thin-film preparation of various electronic 

components.


Medical Devices: Implants, surgical instrument coatings; excellent corrosion resistance and biocompatibility make them 

suitable for the medical device field.


CoCrFeNi-3N-COA

CoCrFeNi 3N 800X600.jpg


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